TRANSFERABILITY OF A SIMPLE ION-IMPLANTATION PROCESS IN GAAS

被引：0
|
作者：
ANDERSON, CL
DUNLAP, HL
MOLNAR, B
COMAS, J
机构：
[1] HUGHES RES LABS, MALIBU, CA 90265 USA
[2] USN, RES LAB, WASHINGTON, DC 20375 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C119 / C119
页数：1
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