CHARACTERIZATION OF THIN-FILMS AND MULTILAYERS BY SPECULAR X-RAY REFLECTIVITY

被引：9
|
作者：
PLOTZ, WM
LISCHKA, K
机构：
来源：
JOURNAL DE PHYSIQUE III | 1994年 / 4卷 / 09期
关键词：
D O I：
10.1051/jp3:1994303
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The application of glancing incidence X-ray reflectivity measurements for the investigation of submicrometer thick layers and multilayer stacks which are produced in modern technology processes is discussed. We describe different setups for X-ray reflectivity measurements and computer methods which allow the extraction of various layer parameters from the experimental data.
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页码：1503 / 1511
页数：9
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