DOMAIN CONFIGURATION UNDER ROTATIONAL FLUX AND APPLIED STRESS CONDITIONS IN SILICON-IRON

被引：6

作者：

PHILLIPS, R ^{[1
]}

OVERSHOT.KJ ^{[1
]}

机构：

[1] UNIV WALES,INST SCI & TECHNOL,WOLFSON CTR TECHNOL SOFT MAT,CARDIFF,WALES

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1974年 / MA10卷 / 02期

关键词：

D O I：

10.1109/TMAG.1974.1058302

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：168 / 169

页数：2

共 50 条

[1] DOMAIN PATTERN IN SILICON-IRON UNDER STRESS
DIJKSTRA, LJ
MARTIUS, UM
[J]. REVIEWS OF MODERN PHYSICS, 1953, 25 (01) : 146 - 150
[2] INFLUENCE OF STRESS ON ROTATIONAL LOSS IN SILICON-IRON
BASAK, A
MOSES, AJ
[J]. PROCEEDINGS OF THE INSTITUTION OF ELECTRICAL ENGINEERS-LONDON, 1978, 125 (02): : 165 - 168
[3] DOMAIN-WALL CONFIGURATION IN CYLINDRICAL SILICON-IRON CRYSTALS
ELYUTIN, NO
BUBLEINIK, AO
SOMENKOV, VA
SHILSHTE.SS
[J]. JETP LETTERS, 1973, 18 (05) : 186 - 187
[4] DOMAIN-STRUCTURES IN SILICON-IRON IN THE STRESS TRANSITION STAGE
MOSES, AJ
MEYDAN, T
LAU, HF
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1995, 31 (06) : 4166 - 4168
[5] EFFECT OF STRESS ON DOMAIN STRUCTURE OF GOSS TEXTURED SILICON-IRON
CORNER, WD
MASON, JJ
[J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1964, 15 (06): : 709 - &
[6] SUBDIVIDED DOMAIN WALLS IN SILICON-IRON
CAREY, R
ISAAC, ED
[J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1966, 17 (02): : 279 - &
[7] MEASUREMENT OF ROTATING FLUX IN SILICON-IRON LAMINATIONS
MOSES, AJ
THOMAS, B
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1973, MAG9 (04) : 651 - 654
[8] EFFECT OF HEAT-TREATMENT IN A MAGNETIC FIELD OR UNDER AN APPLIED STRESS ON MAGNETIC PROPERTIES OF SILICON-IRON
MOSES, AJ
THOMPSON, JE
[J]. JOURNAL OF MATERIALS SCIENCE, 1970, 5 (06) : 463 - &
[9] EFFECTS OF APPLIED STRESS ON THE MAGNETIC-PROPERTIES OF HIGH PERMEABILITY SILICON-IRON
MOSES, AJ
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1979, 15 (06) : 1575 - 1579
[10] ROTATIONAL POWER LOSS IN COMMERCIAL SILICON-IRON LAMINATIONS
YAMAGUCHI, T
NARITA, K
[J]. ELECTRICAL ENGINEERING IN JAPAN, 1976, 96 (04) : 15 - 21

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