INITIAL-STAGES OF THE GROWTH OF FE ON SI(111)7X7

被引：98
|
作者：
ALVAREZ, J
DEPARGA, ALV
HINAREJOS, JJ
DELAFIGUERA, J
MICHEL, EG
OCAL, C
MIRANDA, R
机构：
[1] Departamento de Física de la Materia Condensada, Universidad Autónoma de Madrid
来源：
PHYSICAL REVIEW B | 1993年 / 47卷 / 23期
关键词：
D O I：
10.1103/PhysRevB.47.16048
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We present a multitechnique (scanning tunneling microscopy, photoelectron spectroscopy, and ion scattering spectroscopy) approach to study the formation of the Fe/Si(111) interface at room temperature. The first-deposited Fe atoms react with the surface, displacing Si atoms from their positions. The result is an amorphous layer with composition and density of states close to those of FeSi. On top of this reacted layer, crystallites of Fe with interdiffused Si grow. Upon further Fe deposition, the crystallite composition evolves to pure Fe.
引用
收藏
页码：16048 / 16051
页数：4
相关论文
共 50 条
  • [1] ANGLE-RESOLVED PHOTOEMISSION OF THE INITIAL-STAGES OF AU GROWTH ON SI(111) 7X7
    HOUZAY, F
    GUICHAR, GM
    CROS, A
    SALVAN, F
    PINCHAUX, R
    DERRIEN, J
    [J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1982, 15 (34): : 7065 - 7072
  • [2] A THEORETICAL-STUDY OF THE INITIAL-STAGES OF THE HYDROGENATION OF SI(111) 7X7
    STAUFFER, L
    MINOT, C
    [J]. CATALYSIS LETTERS, 1994, 23 (1-2) : 1 - 11
  • [3] INVESTIGATION OF INITIAL-STAGES OF GROWTH OF AGFILMS ON SI(111)7X7 BY A COMBINATION OF LEED, AES, AND UPS
    WEHKING, F
    BECKERMANN, H
    NIEDERMAYER, R
    [J]. SURFACE SCIENCE, 1978, 71 (02) : 364 - 374
  • [4] Initial stages of In adsorption on Si(111) 7x7
    Lin, XF
    Mai, HA
    Chizhov, I
    Willis, RF
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (02): : 995 - 999
  • [5] Adsorption of disilane on Si(111)-(7x7) and initial stages of CVD growth
    Braun, J
    Rauscher, H
    Behm, RJ
    [J]. SURFACE SCIENCE, 1998, 416 (1-2) : 226 - 239
  • [6] INITIAL-STAGES OF OXYGEN-ADSORPTION ONTO A SI(111)-7X7 SURFACE STUDIED BY STM
    HASEGAWA, T
    KOHNO, M
    HOSAKA, S
    HOSOKI, S
    [J]. SURFACE SCIENCE, 1994, 312 (1-2) : L753 - L756
  • [7] Initial stages of nanoislands formation on Si(111) 7x7 surface
    Vershinin, AV
    Teys, SA
    Shwartz, NL
    Yanovitskaja, ZS
    Zverev, AV
    [J]. EDM 2005: INTERNATIONAL WORKSHOP AND TUTORIALS ON ELECTRON DEVICES AND MATERIALS, PROCEEDINGS, 2005, : 27 - 29
  • [8] Initial stages of Mg adsorption on the Si(111)-7x7 surface
    Chen, Xiaohang
    Zhan, Huahan
    Zhou, Changjie
    Chen, Bo
    Kang, Junyong
    [J]. JOURNAL OF APPLIED PHYSICS, 2010, 107 (02)
  • [9] New model of the initial stages of Si(111)-(7x7) oxidation
    Dujardin, G
    Mayne, A
    Comtet, G
    Hellner, L
    Jamet, M
    LeGoff, E
    Millet, P
    [J]. PHYSICAL REVIEW LETTERS, 1996, 76 (20) : 3782 - 3785
  • [10] A THEORETICAL-STUDY OF THE INITIAL-STAGES OF SI(111)-7X7 OXIDATION .1. THE MOLECULAR PRECURSOR
    SCHUBERT, B
    AVOURIS, P
    HOFFMANN, R
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1993, 98 (09): : 7593 - 7605
12345