STRUCTURE AND COMPOSITION OF SPUTTERED TANTALUM THIN-FILMS ON SILICON STUDIED BY NUCLEAR AND X-RAY ANALYSIS

被引：13

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作者：

CROSET, M

VELASCO, G

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 04期

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D O I：

10.1063/1.1661339

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：1444 / &

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