LOW-TEMPERATURE PLASMA OXIDATION OF GAAS

被引：43
|
作者：
YOKOYAMA, N
MIMURA, T
ODANI, K
FUKUTA, M
机构：
来源：
APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 01期
关键词：
D O I：
10.1063/1.89839
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：58 / 60
页数：3
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