HIGH FREQUENCY BEHAVIOUR OF FILM RESISTORS

被引：0
|
作者：
FUTSCHIK, F
机构：
来源：
PROCEEDINGS ELECTRONIC COMPONENTS CONFERENCE | 1968年 / MAY期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：278 / &
相关论文
共 50 条
  • [1] PRECISION THIN-FILM RESISTORS FOR HIGH FREQUENCY APPLICATIONS
    MACLACHL.DF
    HAMMOND, VJ
    [J]. MICROELECTRONICS RELIABILITY, 1968, 7 (03) : 175 - &
  • [2] Low frequency noise in film resistors
    Sikula, J
    Pavelka, J
    Rocak, D
    Belavic, D
    [J]. QUANTUM 1/F NOISE AND OTHER LOW FREQUENCY FLUCTUATIONS IN ELECTRONIC DEVICES, 1999, 466 : 42 - 47
  • [3] DESIGN OF RESISTORS FOR HIGH-FREQUENCY THIN-FILM MICROCIRCUITS
    GOLOVCHE.VB
    [J]. TELECOMMUNICATIONS AND RADIO ENGINEER-USSR, 1968, (03): : 117 - &
  • [4] BEHAVIOUR OF RESISTORS AT HIGH FREQUENCIES
    ARTHUR, GR
    KRAUSS, HL
    ORDUNG, PF
    CHURCH, SE
    [J]. PROCEEDINGS OF THE INSTITUTE OF RADIO ENGINEERS, 1950, 38 (02): : 203 - 203
  • [5] Bimodal failure behaviour of metal film resistors
    Croes, K
    De Ceuninck, W
    De Schepper, L
    Tielemans, L
    [J]. QUALITY AND RELIABILITY ENGINEERING INTERNATIONAL, 1998, 14 (02) : 87 - 90
  • [6] Microwave power thin film resistors for high frequency and high power load applications
    Jiang, H. C.
    Si, X.
    Zhang, W. L.
    Wang, C. J.
    Peng, B.
    Li, Y. R.
    [J]. APPLIED PHYSICS LETTERS, 2010, 97 (17)
  • [7] EFFECT OF VACUUM ON HIGH-FREQUENCY PROPERTIES OF THIN METAL FILM RESISTORS
    LOMNICZY, M
    [J]. VACUUM, 1967, 17 (06) : 337 - +
  • [8] Specifying high voltage film resistors
    Gladas, Mark
    [J]. Electronic Product Design, 1988, 9 (12): : 31 - 34
  • [9] Formation and Characterization of the High Precision Nanoscale Thin Film Resistors on Radio Frequency Application
    Huang, Huei Yu
    Wu, Chia-Yu
    Wu, Chi-Chang
    [J]. INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE, 2015, 10 (08): : 6517 - 6526
  • [10] Thick Film Resistors with Improved Frequency Behavior.
    Thust, H.
    [J]. Nachrichtentechnik Elektronik, 1979, 29 (03): : 109 - 112
12345