STRUCTURE OF SILICON DIOXIDE FILMS PRODUCED IN A HIGH-FREQUENCY GAS DISCHARGE PLASMA

被引：0

作者：

PAVLOV, PV

ZORIN, EI

SHITOVA, EV

机构：

来源：

SOVIET PHYSICS CRYSTALLOGRAPHY, USSR | 1971年 / 15卷 / 04期

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暂无

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：749 / &

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