DEGRADATION OF METAL-OXIDE SEMICONDUCTOR STRUCTURES BY FOWLER-NORDHEIM TUNNELING INJECTION

被引：21
|
作者：
BALLAND, B
PLOSSU, C
BARDY, S
机构：
来源：
THIN SOLID FILMS | 1987年 / 148卷 / 02期
关键词：
D O I：
10.1016/0040-6090(87)90153-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：149 / 162
页数：14
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