INSITU DC SPUTTERED HIGH-TC Y-BA-CU-O FILMS

被引:2
|
作者
ZAREMBINSKI, S
RAMOS, J
IVANOV, Z
CLAESON, T
机构
[1] Permanently at Institute of Physics, Polish Academy of Sciences, 02-668 Warsaw
[2] Department of Physics, Chalmers University of Technology
来源
关键词
D O I
10.1016/0022-5088(90)90230-H
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Superconducting thin films of Y-Ba-Cu-O were fabricated in-situ by a dc-magnetron sputtering technique. The magnetron gun was designed to give a well defined plasma and a low operating voltage. Transition temperatures, Tc, of up to 85 K (R = 0) were measured for films deposited on Al203, SrTiO3 and MgO substrates using 1:15 oxygen to argon sputtering gas at 0.4 mbar pressure. A higher substrate temperature (670 °C) was needed to obtain an optimal Tc film on sapphire than on magnesium oxide or strontium titanate. Critical current densities of up to 105 A/cm2 at 4.2 K were registered for microbridges etched into films deposited on sapphire and up to 5.105 A/cm2 for those on magnesium oxide substrates. © 1990.
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页码:329 / 335
页数:7
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