SIMPLE OVERDENSE RF PLASMA SOURCE

被引：2
|
作者：
MCWILLIAMS, R
EDRICH, D
PLATT, RC
SHEEHAN, DP
机构：
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1990年 / 61卷 / 11期
关键词：
D O I：
10.1063/1.1141603
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A simple, gas-fed, radio-frequency-driven plasma source is described. By use of lower hybrid waves, noble gas plasmas were produced with electron densities up to 1012 cm-3 over a range of magnetic fields from 400 G to 1.5 kG and rf frequencies from 2-220 MHz.
引用
收藏
页码：3460 / 3463
页数：4
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