DEVELOPMENT OF A NEW-TYPE FULL-ION SOURCE

This article gives the physical thinking and technical design for studying a new-type full-ion source. An optimum configuration of the source, the optimum distribution of electric field and magnetic field in the discharge chamber, and the operation parameters are given by theoretical calculations. The source has features as follows: It has a microwave plasma cathode; in principle, it may produce the ions of all elements in the periodic table and provide high current ion beams; the sputtering mechanism for the production of metal ions has been adopted; the configuration of the source and the distribution of the electric field and magnetic field in the discharge chamber contribute more to producing high-concentrated plasma; ions of multiple charge state may be obtained.