OPTICAL-ABSORPTION OF ION-IMPLANTED AMORPHOUS-SILICON

被引：1
|
作者：
BHATIA, KL [1 ]
KRATSCHMER, W [1 ]
KALBITZER, S [1 ]
机构：
[1] MAX PLANCK INST NUCL PHYS,POB 103980,D-6900 HEIDELBERG 1,FED REP GER
来源：
THIN SOLID FILMS | 1988年 / 163卷
关键词：
D O I：
10.1016/0040-6090(88)90444-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
4
引用
收藏
页码：331 / 335
页数：5
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