REFRACTIVE-INDEX MODIFICATION OF POLYMETHYLMETHACRYLATE (PMMA) THIN-FILMS BY KRF-LASER IRRADIATION

被引：45
|
作者：
BAKER, AK
DYER, PE
机构：
[1] Department of Applied Physics, University of Hull, Hull
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1993年 / 57卷 / 06期
关键词：
D O I：
10.1007/BF00331756
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The prism-coupler technique is used to investigate changes in die refractive index of PolyMethylMethAcrylate (PMMA) waveguide films exposed to low fluence KrF-laser radiation. A small (approximately 0.5%) but significant increase in index for light at 632.8 nm is observed following prolonged exposure, probably due to photochemical modification of the polymer. Weak etching of films is also evident even at a fluence as low as 6 mJ cm-2.
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页码：543 / 544
页数：2
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