PULSED ELECTRODEPOSITION OF COPPER/NICKEL MULTILAYERS ON A ROTATING-DISK ELECTRODE .2. POTENTIOSTATIC DEPOSITION

被引：22
|
作者：
YANG, CC
CHEH, HY
机构：
[1] Department of Chemical Engineering and Applied Chemistry, Columbia University, New York
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1995年 / 142卷 / 09期
关键词：
Boundary conditions - Copper - Current density - Diffusion - Electrolysis - Mathematical models - Multilayers - Nickel;
D O I：
10.1149/1.2048682
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Thin Cu/Ni multilayers were deposited on a rotating disk electrode (RDE) by square-wave potentiostatic pulses. A theoretical model was developed to predict the copper content in the Ni layer on the RDE. The copper content in the Ni layer was measured under a variety of experimental conditions. Theory agrees well with experimental results.
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页码：3040 / 3043
页数：4
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