ENDPOINT DETERMINATION FOR PLASMA-ETCHING WITH A DOUBLE BEAM OPTICAL-EMISSION SPECTROMETER

被引：0

作者：

TSUKADA, T ^{[1
]}

UKAI, K ^{[1
]}

机构：

[1] ANELVA CORP,FUCHU,TOKYO 183,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C91 / C91

页数：1

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