ION-BOMBARDMENT AND THE STABILITY OF FIELD-EMISSION SOURCES

被引：0
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作者：
SMITH, R
THURSTANS, R
WALLS, JM
机构：
[1] LOUGHBOROUGH UNIV TECHNOL,DEPT PHYS,LOUGHBOROUGH LE11 3TU,LEICESTERSHIRE,ENGLAND
[2] LOUGHBOROUGH UNIV TECHNOL,DEPT MATH,LOUGHBOROUGH LE11 3TU,LEICESTERSHIRE,ENGLAND
来源：
ULTRAMICROSCOPY | 1980年 / 5卷 / 02期
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中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
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页码：261 / 262
页数：2
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