ION-IMPLANTATION DOPING OF SEMICONDUCTORS

被引：0
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作者：
SEALY, BJ
机构：
来源：
MATERIALS SCIENCE AND TECHNOLOGY | 1988年 / 4卷 / 06期
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D O I：
10.1179/mst.1988.4.6.500
中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：500 / 512
页数：13
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