8-hydroxyquinoline neodymium;
thin film;
atomic force microscopy;
D O I:
暂无
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
The 8-hydroxyquinoline neodymium (Ndq3) organic thin films deposited on the cleaned indium/tin oxide (ITO) at different deposition rates with the same vacuity (133.3X10(-5) Pa) were revealed by atomic force microscopy (AFM). Organic devices with one layer of Ndq3 as the e-type conductive material at different deposition rates sandwiched between ITO and aluminum electrodes have been fabricated, respectively. Evidence suggests that the current-voltage (I-V) characteristics were determined by the uniformity of organic film which was controlled by the deposition conditions.
机构:
Acad Sinica, Shanghai Inst Opt & Fine Mech, Res Lab High Dens Opt Storage, Shanghai 201800, Peoples R ChinaAcad Sinica, Shanghai Inst Opt & Fine Mech, Res Lab High Dens Opt Storage, Shanghai 201800, Peoples R China
Li, QH
Gan, FX
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机构:
Acad Sinica, Shanghai Inst Opt & Fine Mech, Res Lab High Dens Opt Storage, Shanghai 201800, Peoples R ChinaAcad Sinica, Shanghai Inst Opt & Fine Mech, Res Lab High Dens Opt Storage, Shanghai 201800, Peoples R China