THINNING OF LINBO3 FOR ACOUSTOOPTIC DEFLECTORS BY ION ETCHING

被引：2
|
作者：
YASUDA, H
YAMAGUCHI, M
NAGAI, K
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1972年 / 11卷 / 08期
关键词：
D O I：
10.1143/JJAP.11.1216
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1216 / +
页数：1
相关论文
共 50 条
  • [1] REACTIVE ION ETCHING OF LINBO3
    JACKEL, JL
    HOWARD, RE
    HU, EL
    LYMAN, SP
    APPLIED PHYSICS LETTERS, 1981, 38 (11) : 907 - 909
  • [2] Ion beam enhanced etching of LiNbO3
    Schrempel, F.
    Gischkat, Th.
    Hartung, H.
    Kley, E. -B.
    Wesch, W.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 250 : 164 - 168
  • [3] Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma
    Ren, Z.
    Heard, P. J.
    Marshall, J. M.
    Thomas, P. A.
    Yu, S.
    JOURNAL OF APPLIED PHYSICS, 2008, 103 (03)
  • [4] Etching of ion irradiated LiNbO3 in aqueous hydrofluoric solutions
    Reinisch, Jakob
    Schrempel, Frank
    Gischkat, Thomas
    Wesch, Werner
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (04) : D298 - D301
  • [5] REACTIVE ION-BEAM ETCHING CHARACTERISTICS OF LINBO3
    REN, CX
    YANG, J
    ZHENG, YF
    CHEN, LZ
    CHEN, GL
    TSOU, SC
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 : 1018 - 1021
  • [6] MICROFABRICATION IN LINBO3 BY ION-BOMBARDMENT-ENHANCED ETCHING
    KAWABE, M
    KUBOTA, M
    MASUDA, K
    NAMBA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 1096 - 1098
  • [7] MICROFABRICATION OF LINBO3 BY REACTIVE ION-BEAM ETCHING
    MATSUI, S
    YAMATO, T
    ARITOME, H
    NAMBA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (08) : L463 - L465
  • [8] Etching study of ferroelectric microdomains in LiNbO3 and MgO:LiNbO3
    Holstein, WL
    JOURNAL OF CRYSTAL GROWTH, 1997, 171 (3-4) : 477 - 484
  • [9] GROWTH OF CRATERS ON ION ETCHED SURFACE OF LINBO3 AND ION ETCHING WITH CRATERS
    YASUDA, H
    NAGAI, K
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1972, 11 (11) : 1713 - &
  • [10] Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching
    Tamura, M
    Yoshikado, S
    SURFACE & COATINGS TECHNOLOGY, 2003, 169 : 203 - 207
12345