THERMAL-DEGRADATION OF TISI2/POLY-SI GATES

被引：0
|
作者：
NYGREN, S
NORSTROM, H
OSTLING, M
CHATFIELD, C
RYDEN, KH
BUCHTA, R
PETERSSON, CS
机构：
来源：
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS | 1987年 / 42卷 / 236期
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中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
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页码：179 / 181
页数：3
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