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STRUCTURAL STUDIES OF LOW-TEMPERATURE LOW-PRESSURE CHEMICAL DEPOSITED POLYCRYSTALLINE SILICON
被引:91
|
作者
:
MEAKIN, D
论文数:
0
引用数:
0
h-index:
0
机构:
ARISTOTLE UNIV THESSALONIKI,DEPT PHYS,GR-54006 THESSALONIKI,GREECE
ARISTOTLE UNIV THESSALONIKI,DEPT PHYS,GR-54006 THESSALONIKI,GREECE
MEAKIN, D
[
1
]
STOEMENOS, J
论文数:
0
引用数:
0
h-index:
0
机构:
ARISTOTLE UNIV THESSALONIKI,DEPT PHYS,GR-54006 THESSALONIKI,GREECE
ARISTOTLE UNIV THESSALONIKI,DEPT PHYS,GR-54006 THESSALONIKI,GREECE
STOEMENOS, J
[
1
]
MIGLIORATO, P
论文数:
0
引用数:
0
h-index:
0
机构:
ARISTOTLE UNIV THESSALONIKI,DEPT PHYS,GR-54006 THESSALONIKI,GREECE
ARISTOTLE UNIV THESSALONIKI,DEPT PHYS,GR-54006 THESSALONIKI,GREECE
MIGLIORATO, P
[
1
]
ECONOMOU, NA
论文数:
0
引用数:
0
h-index:
0
机构:
ARISTOTLE UNIV THESSALONIKI,DEPT PHYS,GR-54006 THESSALONIKI,GREECE
ARISTOTLE UNIV THESSALONIKI,DEPT PHYS,GR-54006 THESSALONIKI,GREECE
ECONOMOU, NA
[
1
]
机构
:
[1]
ARISTOTLE UNIV THESSALONIKI,DEPT PHYS,GR-54006 THESSALONIKI,GREECE
来源
:
JOURNAL OF APPLIED PHYSICS
|
1987年
/ 61卷
/ 11期
关键词
:
D O I
:
10.1063/1.338325
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:5031 / 5037
页数:7
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