APPLICATION OF HIGH-RESOLUTION FILM FOR LITHOGRAPHY TO SYNCHROTRON X-RAY TOPOGRAPHY

被引：0
|
作者：
MIZUNO, K
IWAMI, M
HASHIMOTO, E
ITO, K
KINO, T
机构：
[1] HIROSHIMA UNIV,FAC SCI,CRYSTAL PHYS LAB,HIGASHIHIROSHIMA 724,JAPAN
[2] HIROSHIMA DENKI INST TECHNOL,FAC ENGN,HIROSHIMA 730,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 08期
关键词：
HIGH-RESOLUTION FILM; WHITE BEAM TOPOGRAPHY; SYNCHROTRON RADIATION; INTERSTITIAL LOOP; NEARLY PERFECT ALUMINUM CRYSTAL; LATTICE DEFECTS;
D O I：
10.1143/JJAP.33.4793
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A high-resolution film for lithography is applied to a detector for synchrotron radiation topography, instead of a nuclear plate. The film shows much better resolution than that of the plate although exposure time an about 500 times longer is required. The size distribution of interstitial loops grown as vacancy sources in a nearly perfect aluminum crystal after a temperature rise is examined from the white beam topograph.
引用
收藏
页码：4793 / 4794
页数：2
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