AB-INITIO POTENTIAL SURFACE FOR H+4

被引：43

作者：

POSHUSTA, RD ^{[1
]}

ZETIK, DF ^{[1
]}

机构：

[1] WASHINGTON STATE UNIV,CHEM PHYS PROGRAM,PULLMAN,WA 99163

来源：

JOURNAL OF CHEMICAL PHYSICS | 1973年 / 58卷 / 01期

关键词：

D O I：

10.1063/1.1678895

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：118 / 125

页数：8

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