DEEP-LEVEL PHOTOLUMINESCENCE STUDIES OF UNDOPED AND TIN-DOPED (LEC) INP

被引:0
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作者
MA, CS [1 ]
CHAN, PW [1 ]
LO, VC [1 ]
ONG, CW [1 ]
WONG, SP [1 ]
机构
[1] CHINESE UNIV HONG KONG,DEPT ELECTR ENGN,SHA TIN,HONG KONG
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects of tin doping on the deep-level photoluminescence (PL) spectra of (LEC) InP were studied. Specifically, the effect of rapid thermal annealing (RTA) on the deep emission bands labelled as band A (1.13 eV), band B (1.06 eV), band C (1.20 eV) and band D (0.97 eV) were investigated. Band A appeared in both undoped and doped samples, but it disappeared after RTA for all the samples. It is suggested that band A is due to the formation of a complex involving V(In) with residual impurities. The disappearance of band A after RTA is concomitant with the appearance of bands B, C and D. The existence of band B is attributed to the complex formation of V(P) with residual impurities. Band C was observed after the annealing process both in undoped and lightly-tin-doped samples and is believed to be due to the formation of V(P) single point defects. Band D was only observed in heavily doped samples and it is believed to be the effect of In(P) antisite defects.
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页码:215 / 220
页数:6
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