XPS PHOTOELECTRON STUDY OF RHODIUM COMPLEXES ATTACHED TO CHEMICALLY MODIFIED SILICAS

被引：8
|
作者：
KNOZINGER, H
机构：
来源：
INORGANICA CHIMICA ACTA | 1979年 / 37卷 / 02期
关键词：
D O I：
10.1016/S0020-1693(00)95499-9
中图分类号：
O61 [无机化学];
学科分类号：
070301 ; 081704 ;
摘要：
引用
收藏
页码：L537 / L538
页数：2
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