Internal stresses in electrolytic films based on nickel and cobalt

被引：0
|
作者：
Tochitskii, TA
Boltushkin, AV
Shadrov, VG
机构：
来源：
RUSSIAN JOURNAL OF ELECTROCHEMISTRY | 1995年 / 31卷 / 12期
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
A mechanism of formation of internal stresses in electrolytic films based on nickel and cobalt is suggested which takes into consideration the defects of crystal lattice, crystallization pressure, and hydrogen intercalated in the deposit.
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页码：1299 / 1301
页数：3
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