TEMPERATURE DEPENDENCES OF THE PLASMA CHEMICAL ETCHING RATES FOR SEVERAL POLYMERS

被引：0
|
作者：
RYBKIN, VV
MENAGARISHVILI, SD
机构：
来源：
HIGH ENERGY CHEMISTRY | 1993年 / 27卷 / 06期
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暂无
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Temperature dependences of the rates of etching of PVC, PMMA, and high temperature polyethylene polymer films in oxygen glow discharge plasmas and afterglows are given over a range of variation that encompasses changes in the permolecular structure of the polymers. It is shown that, depending on the conditions, qualitative changes in the etching rates and apparent activation energies do not necessarily occur.
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页码：466 / 468
页数：3
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