SECONDARY DISSOCIATION PATHWAYS OF ETHYLSILYLENE RADICAL ON GROUND AND EXCITED-STATE POTENTIAL-ENERGY SURFACES

被引：0
|
作者：
FRANCISCO, JS
机构：
[1] Department of Chemistry, Wayne State University, Detroit
来源：
MOLECULAR PHYSICS | 1991年 / 73卷 / 01期
关键词：
D O I：
10.1080/00268979100101171
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Decomposition pathways of ethylsilylene intermediate are examined with the aim of understanding what are dissociation pathways for the formation of silylene and silicon atoms. Implications for the interpretation of decomposition mechanisms for ethyl silane from experimental studies are discussed.
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页码：235 / 240
页数：6
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