DEPOSITION OF ALUMINUM FROM AN ELECTRON-BEAM SOURCE

被引：7

|

作者：

GRAPER, EB

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 01期

关键词：

D O I：

10.1116/1.1316601

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：33 / &

相关论文

共 50 条

[1] DEPOSITION OF ALUMINUM ON KAPTON LAMINATES BY ELECTRON-BEAM EVAPORATION
SHERMAN, DM
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 1113 - 1116
[2] ELECTRON TRAPPING IN SIO2 DUE TO ELECTRON-BEAM DEPOSITION OF ALUMINUM
NING, TH
JOURNAL OF APPLIED PHYSICS, 1978, 49 (07) : 4077 - 4082
[3] CHARGED PARTICLE FLUX GENERATED BY AN ELECTRON-BEAM DEPOSITION SOURCE
GRAPER, EB
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (01): : 282 - &
[4] HIGH-POWER ELECTRON-BEAM DEPOSITION STUDIES ON ALUMINUM AND GRAPHITE
FARBER, M
SRIVASTAVA, RD
ROBIN, JE
JOURNAL OF APPLIED PHYSICS, 1972, 43 (08) : 3313 - +
[5] DEPOSITION OF UNIFORM ALUMINUM FILMS ON KAPTON LAMINATES BY ELECTRON-BEAM EVAPORATION
SHERMAN, DM
THIN SOLID FILMS, 1977, 45 (03) : 537 - 537
[6] AN INTENSE ELECTRON-BEAM SOURCE
YEHESKEL, J
GAZIT, D
AVIDA, R
FRIEDMAN, M
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1983, 16 (04) : 499 - 504
[7] A REFLEX ELECTRON-BEAM DISCHARGE AS A PLASMA SOURCE FOR ELECTRON-BEAM GENERATION
MURRAY, CS
ROCCA, JJ
SZAPIRO, B
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1988, 16 (05) : 570 - 573
[8] THE PSEUDOSPARK AS AN ELECTRON-BEAM SOURCE
BOGGASCH, E
FINE, TA
RHEE, MJ
PROCEEDINGS OF THE 1989 IEEE PARTICLE ACCELERATOR CONFERENCE, VOLS 1-3: ACCELERATOR SCIENCE AND TECHNOLOGY, 1989, : 316 - 318
[9] Electron-Beam Deposition of Aluminum Nitride and Oxide Ceramic Coatings for Microelectronic Devices
Yushkov, Yury G.
Oks, Efim M.
Tyunkov, Andrey V.
Yushenko, Alexey Yu
Zolotukhin, Denis B.
COATINGS, 2021, 11 (06)
[10] SIMPLE ELECTRON-BEAM EVAPORATOR FOR ALUMINUM
BENNDORF, C
SEIDEL, H
THIEME, F
REVIEW OF SCIENTIFIC INSTRUMENTS, 1976, 47 (06): : 778 - 779

← 1 2 3 4 5 →