INSITU REFLECTIVITY MEASUREMENT IN A RAPID THERMAL PROCESSOR FOR THE STUDY OF PLATINUM SILICIDE FORMATION

被引：4
|
作者：
DILHAC, JM [1 ]
GANIBAL, C [1 ]
CASTAN, T [1 ]
机构：
[1] MOTOROLA SEMICOND GRP,F-31023 TOULOUSE,FRANCE
来源：
APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 21期
关键词：
D O I：
10.1063/1.102068
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2225 / 2226
页数：2
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