DEVELOPMENT OF HIGHLY RELIABLE SYNCHROTRON RADIATION LITHOGRAPHY BEAMLINE

被引：9
|
作者：
OKADA, K [1 ]
FUJII, K [1 ]
KAWASE, Y [1 ]
NAGANO, M [1 ]
机构：
[1] NEC CORP,DIV RES & DEV PLANNING & TECH SERV,MIYAMAE KU,KAWASAKI,KANAGAWA 213,JAPAN
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期
关键词：
D O I：
10.1116/1.584043
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：191 / 194
页数：4
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