ANISOTROPIC (211) SILICON-WAFER ETCHING FOR BLAZED GRATINGS

被引：0
|
作者：
SPIERINGS, GACM
VERHOEVEN, JFC
DENBIGGELAAR, H
GIJSBERS, TG
机构：
来源：
PHILIPS JOURNAL OF RESEARCH | 1989年 / 44卷 / 04期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：407 / 415
页数：9
相关论文
共 50 条
  • [1] Fabrication of blazed gratings and grisms utilizing anisotropic etching of silicon
    Harada, T
    Sakuma, H
    Fuse, M
    THEORY AND PRACTICE OF SURFACE-RELIEF DIFFRACTION GRATINGS: SYNCHROTRON AND OTHER APPLICATIONS, 1998, 3450 : 11 - 16
  • [2] MEMS blazed gratings fabricated using anisotropic etching and oxidation sharpening
    Nie, Qiuyu
    Xie, Yiyuan
    Chang, Fei
    AIP ADVANCES, 2020, 10 (06)
  • [3] Blazed silicon gratings fabricated by deflecting crystal orientation (111)silicon wafer
    Ju, H
    Zhang, P
    Liang, JQ
    Wang, SR
    Wu, YH
    JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2005, 4 (01): : 1 - 4
  • [4] A COMPARISON OF SILICON-WAFER ETCHING BY KOH AND ACID-SOLUTIONS
    DYER, LD
    GRANT, GJ
    TIPTON, CM
    STEPHENS, AE
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (10) : 3016 - 3018
  • [5] THE SILICON-WAFER MARKET
    不详
    SOLID STATE TECHNOLOGY, 1992, 35 (06) : 126 - &
  • [6] SILICON-WAFER POLISHING
    LIU, FW
    CAO, GC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (03) : C100 - C100
  • [7] SILICON-WAFER ETCHING BY TRANSMITTED ELECTRON-BEAM-ENHANCED PLASMA
    INANAMI, R
    SHAO, CL
    MORITA, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (09) : 2541 - 2544
  • [8] DEVELOPMENT OF BONDED SILICON-WAFER
    HOSHI, T
    OGINO, M
    DENKI KAGAKU, 1989, 57 (04): : 321 - 325
  • [9] HYDROPHOBIC SILICON-WAFER BONDING
    TONG, QY
    SCHMIDT, E
    GOSELE, U
    REICHE, M
    APPLIED PHYSICS LETTERS, 1994, 64 (05) : 625 - 627
  • [10] Anisotropic etching for laser texturing of multicrystalline silicon wafer
    Ha, Seung Hyun
    Kim, Ji Hyeon
    Park, Sang Joon
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2017, 645 (01) : 231 - 238
12345