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CHEMICAL COMPOSITION AND ELECTRICAL PROPERTIES OF TIN OXIDE-FILMS PREPARED BY VAPOR-DEPOSITION
被引:86
|
作者
:
ABOAF, JA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FAC,SYST PROD DIV,HOPEWELL JUNCTION,NY 12533
ABOAF, JA
MARCOTTE, VC
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FAC,SYST PROD DIV,HOPEWELL JUNCTION,NY 12533
MARCOTTE, VC
CHOU, NJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,E FISHKILL FAC,SYST PROD DIV,HOPEWELL JUNCTION,NY 12533
CHOU, NJ
机构
:
[1]
IBM CORP,E FISHKILL FAC,SYST PROD DIV,HOPEWELL JUNCTION,NY 12533
[2]
IBM CORP,THOMAS WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1973年
/ 120卷
/ 05期
关键词
:
D O I
:
10.1149/1.2403539
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:701 / 702
页数:2
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