DISSOCIATIVE DIFFUSION OF NICKEL IN SILICON AND SELF-DIFFUSION OF SILICON

被引：102
|
作者：
YOSHIDA, M
SAITO, K
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1967年 / 6卷 / 05期
关键词：
D O I：
10.1143/JJAP.6.573
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：573 / &
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