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- [1] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION OF POLYCRYSTALLINE DIAMOND AND DIAMONDLIKE FILMSJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1988, 6 (03): : 1812 - 1815VITKAVAGE, DJRUDDER, RAFOUNTAIN, GGMARKUNAS, RJ
- [2] CONTROL OF PREFERENTIAL ORIENTATION IN POLYCRYSTALLINE SILICON FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITIONJOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (11) : 3666 - 3674HASEGAWA, SYAMAMOTO, SKURATA, Y
- [3] CONTINUOUS GROWTH OF POLYCRYSTALLINE SILICON FILMS BY CHEMICAL VAPOR-DEPOSITIONJOURNAL OF CRYSTAL GROWTH, 1982, 56 (02) : 313 - 323SARMA, KRRICE, MJ
- [4] STUDY OF THE CHEMICAL-COMPOSITION OF SILICON-NITRIDE FILMS OBTAINED BY CHEMICAL VAPOR-DEPOSITION AND PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITIONSURFACE & COATINGS TECHNOLOGY, 1991, 45 (1-3): : 137 - 146OLIVERI, CBAROETTO, FMAGRO, C
- [5] DEPOSITION OF SILICON OXYNITRIDE THIN-FILMS BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITIONJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 1998 - 2002TSU, DVLUCOVSKY, GMANTINI, MJCHAO, SS
- [6] SILICON EPITAXIAL LAYERS BY PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITIONABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1985, 189 (APR-): : 45 - INORREIF, R
- [8] DEPOSITION OF SILVER FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITIONAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 49 (06): : 691 - 696OEHR, CSUHR, H
- [9] Growth of polycrystalline silicon films at low temperature by plasma enhanced chemical vapor depositionPOLYCRYSTALLINE THIN FILMS: STRUCTURE, TEXTURE, PROPERTIES, AND APPLICATIONS II, 1996, 403 : 345 - 350Hatanaka, YJayatissa, AHIshikawa, KNakanishi, Y
- [10] PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN FILMSAPPLIED PHYSICS LETTERS, 1982, 41 (01) : 75 - 77CHU, JKTANG, CCHESS, DW