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- [4] 0.63 MU-M LASER MIRRORS WITH LOWER REFLECTION AT 3.39 MU-M OPTIKA I SPEKTROSKOPIYA, 1993, 75 (01): : 216 - 218
- [5] LASER-INDUCED DAMAGE PROBABILITY AT 1.06 MU-M AND 0.69 MU-M APPLIED OPTICS, 1973, 12 (04): : 690 - 699
- [6] WAVELENGTH RATIO OF STABILIZED LASER-RADIATION AT 3.39 MU-M AND 0.633 MU-M APPLIED OPTICS, 1983, 22 (21): : 3414 - 3420
- [7] A COMPARATIVE-STUDY OF LASER TISSUE INTERACTION AT 2.94 MU-M AND 10.6 MU-M APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1988, 47 (03): : 259 - 265
- [8] PHOTOABLATION OF GELATIN WITH THE FREE-ELECTRON LASER BETWEEN 2.7 MU-M AND 6.7 MU-M JOURNAL OF REFRACTIVE AND CORNEAL SURGERY, 1994, 10 (04): : 433 - 438
- [9] MEASUREMENTS OF INTENSITY SCALING OF ABLATION PRESSURE AT 10.6 MU-M AND 1.05 MU-M LASER WAVELENGTHS JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1984, 23 (10): : 1353 - 1356
- [10] A 100 MU-M CHERENKOV LASER EXPERIMENT NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1986, 250 (1-2): : 308 - 311