EFFECT OF HIGH X-RAY FLUXES ON LASER-PLASMA X-RAY SPECTROMETERS

被引：1

作者：

WARK, JS ^{[1
]}

WHITLOCK, RR ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1993年 / 64卷 / 07期

关键词：

D O I：

10.1063/1.1143999

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

LiF (200) crystals were heated with the x rays produced when a 30 J, 0.35 mum laser pulse of 0.6 ns duration was incident 6n a gold-coated titanium target at an irradiance of 2.5 X 10(15) W cm-2. A filter arrangement allowed half of the crystal to be heated by the broad band x radiation from the gold plasma, whilst effectively shielding the other half of the crystal. The reflectivity of both x-ray heated and unheated portions of the crystal was monitored by diffracting He-alpha radiation from the underlying titanium from both parts of the crystal. Significant increases in the integrated reflectivity (36%) of the heated crystal were found.

引用

页码：1718 / 1722

页数：5

共 50 条

[1] TRANSIENT EFFECTS IN LASER-PLASMA X-RAY SPECTROMETERS
WARK, JS
[J]. LASER AND PARTICLE BEAMS, 1991, 9 (02) : 569 - 577
[2] OPTIMIZATION OF A LASER-PLASMA X-RAY SOURCE FOR CONTACT X-RAY MICROSCOPY
KONDO, H
TOMIE, T
[J]. JOURNAL OF APPLIED PHYSICS, 1994, 75 (08) : 3798 - 3805
[3] Optimization of a laser-plasma x-ray source for contact x-ray microscopy
[J]. Kondo, H., 1600, American Inst of Physics, Woodbury, NY, United States (75):
[4] X-RAY MULTILAYER STABILITY AT HIGH-POWER LASER-PLASMA X-RAY NANOSECOND IRRADIATION
BESSARAB, AV
ZARETSKII, AI
KUNIN, AV
NASYROV, GF
RUKAVISHNIKOV, NN
SUSLOV, NA
TOKAREV, VA
[J]. PLASMA PHYSICS REPORTS, 1994, 20 (02) : 210 - 213
[5] Laser-Plasma X-ray Sources and Their Applications
Boschetto, Davide
Kim Ta Phuoc
Rousse, Antoine
[J]. ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 2005, 61 : C71 - C72
[6] X-RAY MICROSCOPY WITH LASER-PLASMA SOURCES
MICHETTE, AG
SCHULZ, MS
[J]. IZVESTIYA AKADEMII NAUK SSSR SERIYA FIZICHESKAYA, 1991, 55 (06): : 1259 - 1261
[7] CHARACTERISTICS OF A LASER-PLASMA X-RAY SOURCE
VINOGRADOV, AV
SHLYAPTSEV, VN
[J]. KVANTOVAYA ELEKTRONIKA, 1987, 14 (01): : 5 - 26
[8] High power laser-plasma x-ray source for lithography
Gaeta, CJ
Rieger, H
Turcu, ICE
Forber, RA
Cassidy, KL
Campeau, SM
Powers, MJ
Maldonado, JR
Morris, JH
Foster, RM
Smith, HI
Lim, MH
[J]. EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 : 818 - 833
[9] PROPERTIES OF A LASER-PLASMA X-RAY SOURCE FOR X-RAY-LITHOGRAPHY
CRAWFORD, EA
HOFFMAN, AL
ALBRECHT, GF
SOGARD, MR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06): : 1575 - 1587
[10] Fabrication of 200 nm field effect transistor by X-ray lithography with a laser-plasma X-ray source
Reeves, CM
Turcu, ICE
Prewett, PD
Gundlach, AM
Stevenson, JT
Walton, AJ
Ross, AWS
Lawes, RA
Anastasi, P
Burge, R
Mitchell, P
[J]. ELECTRONICS LETTERS, 1995, 31 (25) : 2218 - 2219

← 1 2 3 4 5 →