ANNEALING AND PHASE STABILITY IN SPUTTERED TA-O THIN-FILMS

被引：0
|
作者：
FEINSTEI.LG [1 ]
HUTTEMAN.RD [1 ]
机构：
[1] BELL TEL LABS INC,ALLENTOWN,PA 18103
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 05期
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D O I：
暂无
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：753 / 753
页数：1
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