PRECIPITATION OF PHOSPHORUS ARSENIC AND BORON IN THIN SILICON FOILS

被引：19

|

作者：

JOSHI, ML

DASH, S

机构：

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1967年 / 11卷 / 03期

关键词：

D O I：

10.1147/rd.113.0271

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

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页码：271 / &

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