SOLUBILITY AND DIFFUSION-COEFFICIENT OF ELECTRICALLY ACTIVE TITANIUM IN SILICON

被引:20
|
作者
KUGE, S
NAKASHIMA, H
机构
[1] Department of Electrical Engineering, Kyushu University, Higashi-ku Fukuoka
关键词
TITANIUM; SILICON; DIFFUSION COEFFICIENT; SOLUBILITY; DEEP LEVEL; DLTS; IN-DEPTH PROFILE; ANNEALING;
D O I
10.1143/JJAP.30.2659
中图分类号
O59 [应用物理学];
学科分类号
摘要
The deep impurity levels and the solubility of titanium in silicon have been investigated by deep level transient spectroscopy (DLTS). It is found that titanium forms multilevels with an acceptor level of E(c) - 0.09 V, a donor level of E(c) - 0.27 eV and a double-donor level of E(v) + 0.28 eV. The solubilities as a function of reciprocal absolute temperature show a good straight line with the activation energy of 3.8 eV. The diffusion coefficient is determined in the high temperature range 1050-1150-degrees-C and in the lower range 600-800-degrees-C. The diffusion coefficient is represented by D(Ti) = 1.2 x 10(-1) exp (- 2.05/kT) cm2 s-1.
引用
收藏
页码:2659 / 2663
页数:5
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