SOME CAUSES FOR NONBULK PROPERTIES IN VACUUM-DEPOSITED FILMS

被引：0
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作者：
ALEXANDE.CH
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 01期
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D O I：
10.1116/1.1318027
中图分类号：
O59 [应用物理学];
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页码：297 / &
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